Analysis of information sources in references of the Wikipedia article "Флеш-память" in Russian language version.
This had already become a problem at the 25nm node requiring the deployment of airgap between the cells to reduce interference
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: Википедия:Обслуживание CS1 (множественные имена: authors list) (ссылка)All the NAND manufacturers adopted an air-gap process to achieve high performance and reliability. Toshiba implemented an air-gap process on its 19nm NAND device, while Samsung adopted it on 21nm. IMFT has used a more mature air-gap process on both the wordline and bitline structure since its 25nm NAND technology.
All the NAND manufacturers adopted an air-gap process to achieve high performance and reliability. Toshiba implemented an air-gap process on its 19nm NAND device, while Samsung adopted it on 21nm. IMFT has used a more mature air-gap process on both the wordline and bitline structure since its 25nm NAND technology.
This had already become a problem at the 25nm node requiring the deployment of airgap between the cells to reduce interference
{{cite news}}
: Википедия:Обслуживание CS1 (множественные имена: authors list) (ссылка)