Masuoka, Fujio; Takato, Hiroshi; Sunouchi, Kazumasa; Okabe, N.; Nitayama, Akihiro; Hieda, K.; Horiguchi, Fumio (December 1988). "High performance CMOS surrounding-gate transistor (SGT) for ultra high density LSIs". Technical Digest., International Electron Devices Meeting: 222—225. doi:10.1109/IEDM.1988.32796. S2CID114148274.
F. Masuoka; M. Asano; H. Iwahashi; T. Komuro; S. Tanaka (1984-12-09). "A new flash E2PROM cell using triple polysilicon technology". International Electronic Devices Meeting. IEEE: 464—467. doi:10.1109/IEDM.1984.190752. S2CID25967023.
Masuoka, F.; Momodomi, M.; Iwata, Y.; Shirota, R. (1987). "New ultra high density EPROM and flash EEPROM with NAND structure cell". Electron Devices Meeting, 1987 International. IEDM 1987. IEEE. doi:10.1109/IEDM.1987.191485.
Masuoka, Fujio; Takato, Hiroshi; Sunouchi, Kazumasa; Okabe, N.; Nitayama, Akihiro; Hieda, K.; Horiguchi, Fumio (December 1988). "High performance CMOS surrounding-gate transistor (SGT) for ultra high density LSIs". Technical Digest., International Electron Devices Meeting: 222—225. doi:10.1109/IEDM.1988.32796. S2CID114148274.
F. Masuoka; M. Asano; H. Iwahashi; T. Komuro; S. Tanaka (1984-12-09). "A new flash E2PROM cell using triple polysilicon technology". International Electronic Devices Meeting. IEEE: 464—467. doi:10.1109/IEDM.1984.190752. S2CID25967023.
Masuoka, F.; Momodomi, M.; Iwata, Y.; Shirota, R. (1987). "New ultra high density EPROM and flash EEPROM with NAND structure cell". Electron Devices Meeting, 1987 International. IEDM 1987. IEEE. doi:10.1109/IEDM.1987.191485.