Kiselplatta (Swedish Wikipedia)

Reinhard Voelkel (2012). ”Wafer-scale micro-optics fabrication”. Advanced Optical Technologies 1 (3): sid. 135. doi:10.1515/aot-2012-0013. Bibcode: 2012AdOT....1..135V.

archive.today (Global: 28^th place; Swedish: 154^th place)

”Evolution of the Silicon Wafer”. F450C. Arkiverad från originalet den januari 5, 2016. https://archive.today/20160105165200/http://www.f450c.org/infographic/. Läst 9 april 2025.
”Evolution Of Silicon Wafer | F450C” (på amerikansk engelska). F450C. Arkiverad från originalet den 2016-01-05. https://archive.today/20160105165200/http://www.f450c.org/infographic/. Läst 9 april 2025.

books.google.com (Global: 3^rd place; Swedish: 54^th place)

Laplante, Phillip A. (2005). ”Wafer”. Comprehensive Dictionary of Electrical Engineering (2nd). Boca Raton, Florida: CRC Press. Sid. 739. ISBN 978-0-8493-3086-5.
Levy, Roland Albert (1989). Microelectronic Materials and Processes. Springer. Sid. 1–2. ISBN 978-0-7923-0154-7. https://books.google.com/books?id=wZPRPU6ne7UC&pg=PA248. Läst 23 februari 2008.
Grovenor, C. (1989). Microelectronic Materials. CRC Press. Sid. 113–123. ISBN 978-0-85274-270-9. https://books.google.com/books?id=Ecl_mnz1xcUC&q=GaAs+Wafer+Manufacture&pg=PA122. Läst 25 februari 2008.
Nishi, Yoshio (2000). Handbook of Semiconductor Manufacturing Technology. CRC Press. Sid. 67–71. ISBN 978-0-8247-8783-7. https://books.google.com/books?id=Qi98H-iTgLEC&q=wafer+flat+and+notch&pg=PA70. Läst 25 februari 2008.
O'Mara, William C. (1990). Handbook of Semiconductor Silicon Technology. William Andrew Inc. Sid. 349–352. ISBN 978-0-8155-1237-0. https://books.google.com/books?id=COcVgAtqeKkC&q=Czochralski+Silicon+Crystal+Face+Cubic&pg=PA351. Läst 24 februari 2008.
Nishi, Yoshio (2000). Handbook of Semiconductor Manufacturing Technology. Boca Raton, Florida: CRC Press. Sid. 108–109. ISBN 978-0-8247-8783-7. https://books.google.com/books?id=Qi98H-iTgLEC&q=wafer+flat+and+notch&pg=PA70. Läst 25 februari 2008.
Widmann, Dietrich (2000). Technology of Integrated Circuits. Springer. Sid. 39. ISBN 978-3-540-66199-3. https://books.google.com/books?id=uYNn1N6YSwQC&q=Czochralski+Doping+Silicon&pg=PA39. Läst 24 februari 2008.
Levy, Roland Albert (1989). Microelectronic Materials and Processes. Springer. Sid. 6–7, 13. ISBN 978-0-7923-0154-7. https://books.google.com/books?id=wZPRPU6ne7UC&pg=PA248. Läst 23 februari 2008.

doi.org (Global: 2^nd place; Swedish: 16^th place)

dx.doi.org

Reinhard Voelkel (2012). ”Wafer-scale micro-optics fabrication”. Advanced Optical Technologies 1 (3): sid. 135. doi:10.1515/aot-2012-0013. Bibcode: 2012AdOT....1..135V.
T. Doi; I.D. Marinescu; Syuhei Kurokawa (2012). Advances in CMP Polishing Technologies, Chapter 6 – Progress of the Semiconductor and Silicon Industries – Growing Semiconductor Markets and Production Areas. Elsevier. Sid. 297–304. doi:10.1016/B978-1-4377-7859-5.00006-5.

eetimes.com (Global: 4,224^th place; Swedish: low place)

LaPedus, Mark (14 januari 2009). ”450-mm fab debate surfaces”. EE Times. Aspencore. https://www.eetimes.com/450-mm-fab-debate-surfaces/. ”As reported, Intel, TSMC and Samsung are separately pushing for the advent of 450-mm prototype fabs by 2012”