Atomic Layer Deposition of Tungsten(III) Oxide Thin Films from W2(NMe2)6 and Water: Precursor-Based Control of Oxidation State in the Thin Film Material Charles L. Dezelah IV, Oussama M. El-Kadri, Imre M. Szilagyi, Joseph M. Campbell, Kai Arstila, Lauri Niinistö, Charles H. Winter, J. Am. Chem. Soc., 128 (30), 9638 -9639, (2006)எஆசு:10.1021/ja063272w