电子束诱导沉积 (Chinese Wikipedia)
Analysis of information sources in references of the Wikipedia article "电子束诱导沉积" in Chinese language version.
refsWebsite
Global rank
Chinese rank
18th place
57th place
doi.org (Global: 2nd place; Chinese: 23rd place)
- Kiyohara, Shuji; Takamatsu, Hideaki; Mori, Katsumi. Microfabrication of diamond films by localized electron beam chemical vapour deposition. Semiconductor Science and Technology. 2002, 17 (10): 1096. Bibcode:2002SeScT..17.1096K. doi:10.1088/0268-1242/17/10/311.
- Nayak, A.; Banerjee, H. D. Electron beam activated plasma chemical vapour deposition of polycrystalline diamond films. Physica Status Solidi (a). 1995, 151: 107. doi:10.1002/pssa.2211510112.
- Randolph, S.; Fowlkes, J.; Rack, P. Focused, Nanoscale Electron-Beam-Induced Deposition and Etching. Critical Reviews of Solid State and Materials Sciences. 2006, 31 (3): 55. Bibcode:2006CRSSM..31...55R. doi:10.1080/10408430600930438.
- K. Furuya. Nanofabrication by advanced electron microscopy using intense and focused beam. Sci. Technol. Adv. Mater. 2008, 9 (1): 014110. Bibcode:2008STAdM...9a4110F. PMC 5099805
. doi:10.1088/1468-6996/9/1/014110. - M. Song and K. Furuya. Fabrication and characterization of nanostructures on insulator substrates by electron-beam-induced deposition. Sci. Technol. Adv. Mater. 2008, 9 (2): 023002. Bibcode:2008STAdM...9b3002S. PMC 5099707 . doi:10.1088/1468-6996/9/2/023002.
- Erni, Rolf; Rossell, MD; Kisielowski, C; Dahmen, U. Atomic-Resolution Imaging with a Sub-50-pm Electron Probe. Physical Review Letters. 2009, 102 (9): 096101. Bibcode:2009PhRvL.102i6101E. PMID 19392535. doi:10.1103/PhysRevLett.102.096101.
- Van Dorp, Willem F. Approaching the Resolution Limit of Nanometer-Scale Electron Beam-Induced Deposition. Nano Letters. 2005, 5 (7): 1303–7. Bibcode:2005NanoL...5.1303V. PMID 16178228. doi:10.1021/nl050522i.
- Luxmoore, I; Ross, I; Cullis, A; Fry, P; Orr, J; Buckle, P; Jefferson, J. Low temperature electrical characterisation of tungsten nano-wires fabricated by electron and ion beam induced chemical vapour deposition. Thin Solid Films. 2007, 515 (17): 6791. Bibcode:2007TSF...515.6791L. doi:10.1016/j.tsf.2007.02.029.
harvard.edu (Global: 18th place; Chinese: 57th place)
ui.adsabs.harvard.edu
- Kiyohara, Shuji; Takamatsu, Hideaki; Mori, Katsumi. Microfabrication of diamond films by localized electron beam chemical vapour deposition. Semiconductor Science and Technology. 2002, 17 (10): 1096. Bibcode:2002SeScT..17.1096K. doi:10.1088/0268-1242/17/10/311.
- Randolph, S.; Fowlkes, J.; Rack, P. Focused, Nanoscale Electron-Beam-Induced Deposition and Etching. Critical Reviews of Solid State and Materials Sciences. 2006, 31 (3): 55. Bibcode:2006CRSSM..31...55R. doi:10.1080/10408430600930438.
- K. Furuya. Nanofabrication by advanced electron microscopy using intense and focused beam. Sci. Technol. Adv. Mater. 2008, 9 (1): 014110. Bibcode:2008STAdM...9a4110F. PMC 5099805 . doi:10.1088/1468-6996/9/1/014110.
- M. Song and K. Furuya. Fabrication and characterization of nanostructures on insulator substrates by electron-beam-induced deposition. Sci. Technol. Adv. Mater. 2008, 9 (2): 023002. Bibcode:2008STAdM...9b3002S. PMC 5099707 . doi:10.1088/1468-6996/9/2/023002.
- Erni, Rolf; Rossell, MD; Kisielowski, C; Dahmen, U. Atomic-Resolution Imaging with a Sub-50-pm Electron Probe. Physical Review Letters. 2009, 102 (9): 096101. Bibcode:2009PhRvL.102i6101E. PMID 19392535. doi:10.1103/PhysRevLett.102.096101.
- Van Dorp, Willem F. Approaching the Resolution Limit of Nanometer-Scale Electron Beam-Induced Deposition. Nano Letters. 2005, 5 (7): 1303–7. Bibcode:2005NanoL...5.1303V. PMID 16178228. doi:10.1021/nl050522i.
- Luxmoore, I; Ross, I; Cullis, A; Fry, P; Orr, J; Buckle, P; Jefferson, J. Low temperature electrical characterisation of tungsten nano-wires fabricated by electron and ion beam induced chemical vapour deposition. Thin Solid Films. 2007, 515 (17): 6791. Bibcode:2007TSF...515.6791L. doi:10.1016/j.tsf.2007.02.029.
nih.gov (Global: 4th place; Chinese: 5th place)
ncbi.nlm.nih.gov
- K. Furuya. Nanofabrication by advanced electron microscopy using intense and focused beam. Sci. Technol. Adv. Mater. 2008, 9 (1): 014110. Bibcode:2008STAdM...9a4110F. PMC 5099805 . doi:10.1088/1468-6996/9/1/014110.
- M. Song and K. Furuya. Fabrication and characterization of nanostructures on insulator substrates by electron-beam-induced deposition. Sci. Technol. Adv. Mater. 2008, 9 (2): 023002. Bibcode:2008STAdM...9b3002S. PMC 5099707 . doi:10.1088/1468-6996/9/2/023002.
- Erni, Rolf; Rossell, MD; Kisielowski, C; Dahmen, U. Atomic-Resolution Imaging with a Sub-50-pm Electron Probe. Physical Review Letters. 2009, 102 (9): 096101. Bibcode:2009PhRvL.102i6101E. PMID 19392535. doi:10.1103/PhysRevLett.102.096101.
- Van Dorp, Willem F. Approaching the Resolution Limit of Nanometer-Scale Electron Beam-Induced Deposition. Nano Letters. 2005, 5 (7): 1303–7. Bibcode:2005NanoL...5.1303V. PMID 16178228. doi:10.1021/nl050522i.