高铼酸钠 (Chinese Wikipedia)

Analysis of information sources in references of the Wikipedia article "高铼酸钠" in Chinese language version.

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basechem.org

高铼酸钾. 化学品数据库. [2017-04-06]. （原始内容存档于2017-04-06）.

doi.org

A. P. Ginsberg, C. R. Sprinkle. Nonahydridorhenate Salts. Inorganic Syntheses. Inorganic Syntheses 13. 1972: 219–225. ISBN 9780470132449. doi:10.1002/9780470132449.ch45.
Crocker, Lisa S.; Gould, George L.; Heinekey, D. Michael. Improved Synthesis of Carbonylrhenium. Journal of Organometallic Chemistry. 1988, 342 (2): 243–244. doi:10.1016/s0022-328x(00)99461-0.
Hämäläinen, Jani; Mizohata, Kenichiro; Meinander, Kristoffer; Mattinen, Miika; Vehkamäki, Marko; Räisänen, Jyrki; Ritala, Mikko; Leskelä, Markku. Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition. Angewandte Chemie International Edition. 2018-08-27, 57 (44): 14538–14542. ISSN 1433-7851. PMID 30048031. doi:10.1002/anie.201806985. hdl:10138/325623  （英语）.

handle.net

hdl.handle.net

Hämäläinen, Jani; Mizohata, Kenichiro; Meinander, Kristoffer; Mattinen, Miika; Vehkamäki, Marko; Räisänen, Jyrki; Ritala, Mikko; Leskelä, Markku. Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition. Angewandte Chemie International Edition. 2018-08-27, 57 (44): 14538–14542. ISSN 1433-7851. PMID 30048031. doi:10.1002/anie.201806985. hdl:10138/325623  （英语）.

nih.gov

ncbi.nlm.nih.gov

Hämäläinen, Jani; Mizohata, Kenichiro; Meinander, Kristoffer; Mattinen, Miika; Vehkamäki, Marko; Räisänen, Jyrki; Ritala, Mikko; Leskelä, Markku. Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition. Angewandte Chemie International Edition. 2018-08-27, 57 (44): 14538–14542. ISSN 1433-7851. PMID 30048031. doi:10.1002/anie.201806985. hdl:10138/325623  （英语）.

web.archive.org

高铼酸钾. 化学品数据库. [2017-04-06]. （原始内容存档于2017-04-06）.

worldcat.org

Hämäläinen, Jani; Mizohata, Kenichiro; Meinander, Kristoffer; Mattinen, Miika; Vehkamäki, Marko; Räisänen, Jyrki; Ritala, Mikko; Leskelä, Markku. Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition. Angewandte Chemie International Edition. 2018-08-27, 57 (44): 14538–14542. ISSN 1433-7851. PMID 30048031. doi:10.1002/anie.201806985. hdl:10138/325623  （英语）.