Extreme ultraviolet lithography (English Wikipedia)

O'Sullivan, Gerry; Li, Bowen; D'Arcy, Rebekah; Dunne, Padraig; Hayden, Paddy; Kilbane, Deirdre; McCormack, Tom; Ohashi, Hayato; O'Reilly, Fergal; Sheridan, Paul; Sokell, Emma; Suzuki, Chihiro; Higashiguchi, Takeshi (2015). "Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development". Journal of Physics B: Atomic, Molecular and Optical Physics. 48 (144025): 144025. Bibcode:2015JPhB...48n4025O. doi:10.1088/0953-4075/48/14/144025. S2CID 124221931.
Bjorkholm, J.; Bokor, J.; Eichner, L.; Freeman, R.; Mansfield, W.; Szeto, L.; Taylor, D.; Tennant, D.; Wood II, O.; Jewell, T.; White, D.; Waskiewicz, W.; Windt, D.; MacDowell, A. (1991). "Soft x-ray projection lithography". Optics and Photonics News. 2 (5): 27. doi:10.1364/OPN.2.5.000027.
Krome, Thorsten; Schmidt, Jonas; Nesládek, Pavel (2018). "EUV capping layer integrity". In Takehisa, Kiwamu (ed.). Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology. Proceedings of SPIE. Vol. 10807. p. 108070E. doi:10.1117/12.2324670. ISBN 978-1-5106-2201-2.
Matsumoto, Hiroshi; Yamaguchi, Keisuke; Kimura, Hayato; Nakayamada, Noriaki (2021). "Multi-beam mask writer, MBM-2000". In Ando, Akihiko (ed.). Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology. Proceedings of SPIE. Vol. 11908. p. 119080L. doi:10.1117/12.2604378. ISBN 978-1-5106-4685-8.
Waiblinger, M.; Kornilov, K.; Hofmann, T.; Edinger, K. (2010). "E-beam induced EUV photomask repair: A perfect match". In Behringer, Uwe F.W.; Maurer, Wilhelm (eds.). 26th European Mask and Lithography Conference. Proceedings of SPIE. Vol. 7545. pp. 75450P. doi:10.1117/12.863542.
Tomie, Toshihisa (2012-05-21). "Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects". Journal of Micro/Nanolithography, MEMS, and MOEMS. 11 (2): 021109–1. doi:10.1117/1.JMM.11.2.021109. ISSN 1932-5150.
Elg, Daniel T.; Sporre, John R.; Panici, Gianluca A.; Srivastava, Shailendra N.; Ruzic, David N. (2016). "In situ collector cleaning and extreme ultraviolet reflectivity restoration by hydrogen plasma for extreme ultraviolet sources" (PDF). Journal of Vacuum Science & Technology A. 34 (21305): 021305. Bibcode:2016JVSTA..34b1305E. doi:10.1116/1.4942456.
Bosgra, Jeroen; Zoethout, Erwin; van der Eerden, Ad M. J.; Verhoeven, Jan; van de Kruijs, Robbert W. E.; Yakshin, Andrey E.; Bijkerk, Fred (2012). "Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors". Applied Optics. 51 (36): 8541–8548. Bibcode:2012ApOpt..51.8541B. doi:10.1364/AO.51.008541. PMID 23262592.
Yang, De-Kun (2022-07-13). "The development of laser-produced plasma EUV light source". Chip. 1 (3). 100019. doi:10.1016/j.chip.2022.100019.
Schmoeller, Thomas; Klimpel, T.; Kim, I.; Lorusso, G.; Myers, A. F.; Jonckheere, Rik; Goethals, Anne-Marie; Ronse, K. (14 March 2008). "EUV pattern shift compensation strategies". In Schellenberg, Frank M. (ed.). Emerging Lithographic Technologies XII. Proceedings of SPIE. Vol. 6921. pp. 69211B. doi:10.1117/12.772640. S2CID 121926142 – via ResearchGate.
Tao, Y.; et al. (2005). "Characterization of density profile of laser-produced Sn plasma for 13.5 nm extreme ultraviolet source". Appl. Phys. Lett. 86 (20): 201501. Bibcode:2005ApPhL..86t1501T. doi:10.1063/1.1931825.
Nadir Faradzhev; Vadim Sidorkin (2009). "Hydrogen mediated transport of Sn to Ru film surface" (PDF). J. Vac. Sci. Technol. A. 27 (2): 306–314. Bibcode:2009JVSTA..27..306F. doi:10.1116/1.3081968. Archived from the original (PDF) on 2016-12-20. Retrieved 2016-12-14.
Paetzel, R.; et al. (2003). Yen, Anthony (ed.). "Excimer lasers for superhigh NA 193-nm lithography". Proc. SPIE. Optical Microlithography XVI. 5040: 1665. Bibcode:2003SPIE.5040.1665P. doi:10.1117/12.485344. S2CID 18953813.
Harilal, S. S.; et al. (2006). "Spectral control of emissions from tin doped targets for extreme ultraviolet lithography". J. Phys. D. 39 (3): 484–487. Bibcode:2006JPhD...39..484H. doi:10.1088/0022-3727/39/3/010. S2CID 34621555.
Yunfei Deng; Bruno M. La Fontaine; Harry J. Levinson; Andrew R. Neureuther (2003). "Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging". In Roxann L. Engelstad (ed.). Emerging Lithographic Technologies VII. Vol. 5037. doi:10.1117/12.484986. S2CID 137035695.
Miyakawa, R.; Naulleau, P. (May 13, 2019). "Preparing for the Next Generation of EUV Lithography at the Center for X-ray Optics". Synchrotron Radiation News. 32 (4): 15–21. Bibcode:2019SRNew..32...15M. doi:10.1080/08940886.2019.1634432. OSTI 1582044. S2CID 202145457 – via escholarship.org.
R., Saathof (1 December 2018). Adaptive Optics to Counteract Thermal Aberrations: System Design for EUV-Lithography with Sub-nm Precision (Doctoral thesis). Technische Universiteit Delft. doi:10.4233/uuid:1d71e3e8-88ce-4260-aeda-af0ee7675445.
George, Simi A.; Nauleau, Patrick; Rekawa, Senajith; Gullikson, Eric; Kemp, Charles D. (February 23, 2009). Schellenberg, Frank M; La Fontaine, Bruno M (eds.). "Out-of-band exposure characterization with the SEMATECH Berkeley 0.3-NA microfield exposure tool". Journal of Micro/Nanolithography, MEMS, and MOEMS. Alternative Lithographic Technologies. 7271: 72710X. Bibcode:2009SPIE.7271E..0XG. doi:10.1117/12.814429. OSTI 960237. S2CID 55241073.
Yakshin, A. E.; Kozhevnikov, I. V.; Zoethout, E.; Louis, E.; Bijkerk, F. (2010). "[PDF] Properties of broadband depth-graded multilayer mirrors for EUV optical systems. | Semantic Scholar". Optics Express. 18 (7): 6957–71. doi:10.1364/OE.18.006957. PMID 20389715. S2CID 16163302.
Hsu, Stephen D.; Liu, Jingjing (1 January 2017). "Challenges of anamorphic high-NA lithography and mask making". Advanced Optical Technologies. 6 (3–4): 293. Bibcode:2017AdOT....6..293H. doi:10.1515/aot-2017-0024. S2CID 67056068.
Zhang, Zinan; Li, Sikun; Wang, Xiangzhao; Cheng, Wei; Qi, Yuejing (2021). "Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm". Optics Express. 29 (4): 5448–5465. Bibcode:2021OExpr..29.5448Z. doi:10.1364/OE.418242. PMID 33726081. S2CID 232263498.
Naulleau, Patrick P.; Rammeloo, Clemens; Cain, Jason P.; Dean, Kim; Denham, Paul; Goldberg, Kenneth A.; Hoef, Brian; La Fontaine, Bruno; Pawloski, Adam R.; Larson, Carl; Wallraff, Greg (2006). Lercel, Michael J (ed.). "Investigation of the Current Resolution Limits of Advanced Extreme Ultraviolet (EUV) Resists". Emerging Lithographic Technologies X. 6151: 289. Bibcode:2006SPIE.6151..289N. CiteSeerX 10.1.1.215.7131. doi:10.1117/12.657005. S2CID 97250792.
Pantisano, L; Schram, Tom; Li, Z; Lisoni, Judit; Pourtois, Geoffrey; De Gendt, Stefan; P. Brunco, D; Akheyar, A; Afanas'ev, V.V.; Shamuilia, Sheron; Stesmans, A (12 June 2006). "Ruthenium gate electrodes on SiO2 and HfO2: Sensitivity to hydrogen and oxygen ambients". Applied Physics Letters. 88 (24): 243514. Bibcode:2006ApPhL..88x3514P. doi:10.1063/1.2212288 – via ResearchGate.
Thedjoisworo, Bayu; Cheung, David; Crist, Vince (2013). "Comparison of the effects of downstream H2- and O2-based plasmas on the removal of photoresist, silicon, and silicon nitride". Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 31 (2): 021206. Bibcode:2013JVSTB..31b1206T. doi:10.1116/1.4792254. ISSN 2166-2746.
Huang, Y. H.; Lin, C. J.; King, Y. C. (2023). "A study of hydrogen plasma-induced charging effect in EUV lithography systems". Discover Nano. 18 (1): 22. Bibcode:2023NRL....18...22H. doi:10.1186/s11671-023-03799-4. PMC 9950305. PMID 36823307.
van de Kerkhof, Mark; Yakunin, Andrei M.; Kvon, Vladimir; Nikipelov, Andrey; Astakhov, Dmitry; Krainov, Pavel; Banine, Vadim (June 3, 2022). "EUV-induced hydrogen plasma and particle release". Radiation Effects and Defects in Solids. 177 (5–6): 486–512. Bibcode:2022REDS..177..486V. doi:10.1080/10420150.2022.2048657.
Fukuda, Hiroshi (February 23, 2019). "Localized and cascading secondary electron generation as causes of stochastic defects in extreme ultraviolet projection lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 18 (1): 013503. Bibcode:2019JMM&M..18a3503F. doi:10.1117/1.JMM.18.1.013503.
Lee, Inhwan; Franke, Joern-Holger; Philipsen, Vicky; Ronse, Kurt; De Gendt, Stefan; Hendrickx, Eric (2023). "Hyper-NA EUV lithography: An imaging perspective". In Lio, Anna; Burkhardt, Martin (eds.). Optical and EUV Nanolithography XXXVI. Vol. 12494. p. 7. Bibcode:2023SPIE12494E..05L. doi:10.1117/12.2659153. ISBN 978-1-5106-6095-3.
Mojarad, Nassir; Gobrecht, Jens; Ekinci, Yasin (18 March 2015). "Beyond EUV lithography: a comparative study of efficient photoresists' performance". Scientific Reports. 5 (1): 9235. Bibcode:2015NatSR...5.9235M. doi:10.1038/srep09235. PMC 4363827. PMID 25783209.

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This EUV source has been chosen due to its high CO₂ laser to EUV conversion efficiency (~ 5 % or more). See "Igor Fomenkov, EUV Source for Lithography in HVM - performance and prospects, ASML Fellow, Source workshop, Amsterdam, 2019-11-05".
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O'Sullivan, Gerry; Li, Bowen; D'Arcy, Rebekah; Dunne, Padraig; Hayden, Paddy; Kilbane, Deirdre; McCormack, Tom; Ohashi, Hayato; O'Reilly, Fergal; Sheridan, Paul; Sokell, Emma; Suzuki, Chihiro; Higashiguchi, Takeshi (2015). "Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development". Journal of Physics B: Atomic, Molecular and Optical Physics. 48 (144025): 144025. Bibcode:2015JPhB...48n4025O. doi:10.1088/0953-4075/48/14/144025. S2CID 124221931.
Elg, Daniel T.; Sporre, John R.; Panici, Gianluca A.; Srivastava, Shailendra N.; Ruzic, David N. (2016). "In situ collector cleaning and extreme ultraviolet reflectivity restoration by hydrogen plasma for extreme ultraviolet sources" (PDF). Journal of Vacuum Science & Technology A. 34 (21305): 021305. Bibcode:2016JVSTA..34b1305E. doi:10.1116/1.4942456.
Bosgra, Jeroen; Zoethout, Erwin; van der Eerden, Ad M. J.; Verhoeven, Jan; van de Kruijs, Robbert W. E.; Yakshin, Andrey E.; Bijkerk, Fred (2012). "Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors". Applied Optics. 51 (36): 8541–8548. Bibcode:2012ApOpt..51.8541B. doi:10.1364/AO.51.008541. PMID 23262592.
Tao, Y.; et al. (2005). "Characterization of density profile of laser-produced Sn plasma for 13.5 nm extreme ultraviolet source". Appl. Phys. Lett. 86 (20): 201501. Bibcode:2005ApPhL..86t1501T. doi:10.1063/1.1931825.
Nadir Faradzhev; Vadim Sidorkin (2009). "Hydrogen mediated transport of Sn to Ru film surface" (PDF). J. Vac. Sci. Technol. A. 27 (2): 306–314. Bibcode:2009JVSTA..27..306F. doi:10.1116/1.3081968. Archived from the original (PDF) on 2016-12-20. Retrieved 2016-12-14.
Paetzel, R.; et al. (2003). Yen, Anthony (ed.). "Excimer lasers for superhigh NA 193-nm lithography". Proc. SPIE. Optical Microlithography XVI. 5040: 1665. Bibcode:2003SPIE.5040.1665P. doi:10.1117/12.485344. S2CID 18953813.
Harilal, S. S.; et al. (2006). "Spectral control of emissions from tin doped targets for extreme ultraviolet lithography". J. Phys. D. 39 (3): 484–487. Bibcode:2006JPhD...39..484H. doi:10.1088/0022-3727/39/3/010. S2CID 34621555.
Miyakawa, R.; Naulleau, P. (May 13, 2019). "Preparing for the Next Generation of EUV Lithography at the Center for X-ray Optics". Synchrotron Radiation News. 32 (4): 15–21. Bibcode:2019SRNew..32...15M. doi:10.1080/08940886.2019.1634432. OSTI 1582044. S2CID 202145457 – via escholarship.org.
George, Simi A.; Nauleau, Patrick; Rekawa, Senajith; Gullikson, Eric; Kemp, Charles D. (February 23, 2009). Schellenberg, Frank M; La Fontaine, Bruno M (eds.). "Out-of-band exposure characterization with the SEMATECH Berkeley 0.3-NA microfield exposure tool". Journal of Micro/Nanolithography, MEMS, and MOEMS. Alternative Lithographic Technologies. 7271: 72710X. Bibcode:2009SPIE.7271E..0XG. doi:10.1117/12.814429. OSTI 960237. S2CID 55241073.
Hsu, Stephen D.; Liu, Jingjing (1 January 2017). "Challenges of anamorphic high-NA lithography and mask making". Advanced Optical Technologies. 6 (3–4): 293. Bibcode:2017AdOT....6..293H. doi:10.1515/aot-2017-0024. S2CID 67056068.
Zhang, Zinan; Li, Sikun; Wang, Xiangzhao; Cheng, Wei; Qi, Yuejing (2021). "Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm". Optics Express. 29 (4): 5448–5465. Bibcode:2021OExpr..29.5448Z. doi:10.1364/OE.418242. PMID 33726081. S2CID 232263498.
Naulleau, Patrick P.; Rammeloo, Clemens; Cain, Jason P.; Dean, Kim; Denham, Paul; Goldberg, Kenneth A.; Hoef, Brian; La Fontaine, Bruno; Pawloski, Adam R.; Larson, Carl; Wallraff, Greg (2006). Lercel, Michael J (ed.). "Investigation of the Current Resolution Limits of Advanced Extreme Ultraviolet (EUV) Resists". Emerging Lithographic Technologies X. 6151: 289. Bibcode:2006SPIE.6151..289N. CiteSeerX 10.1.1.215.7131. doi:10.1117/12.657005. S2CID 97250792.
Pantisano, L; Schram, Tom; Li, Z; Lisoni, Judit; Pourtois, Geoffrey; De Gendt, Stefan; P. Brunco, D; Akheyar, A; Afanas'ev, V.V.; Shamuilia, Sheron; Stesmans, A (12 June 2006). "Ruthenium gate electrodes on SiO2 and HfO2: Sensitivity to hydrogen and oxygen ambients". Applied Physics Letters. 88 (24): 243514. Bibcode:2006ApPhL..88x3514P. doi:10.1063/1.2212288 – via ResearchGate.
Thedjoisworo, Bayu; Cheung, David; Crist, Vince (2013). "Comparison of the effects of downstream H2- and O2-based plasmas on the removal of photoresist, silicon, and silicon nitride". Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 31 (2): 021206. Bibcode:2013JVSTB..31b1206T. doi:10.1116/1.4792254. ISSN 2166-2746.
Huang, Y. H.; Lin, C. J.; King, Y. C. (2023). "A study of hydrogen plasma-induced charging effect in EUV lithography systems". Discover Nano. 18 (1): 22. Bibcode:2023NRL....18...22H. doi:10.1186/s11671-023-03799-4. PMC 9950305. PMID 36823307.
van de Kerkhof, Mark; Yakunin, Andrei M.; Kvon, Vladimir; Nikipelov, Andrey; Astakhov, Dmitry; Krainov, Pavel; Banine, Vadim (June 3, 2022). "EUV-induced hydrogen plasma and particle release". Radiation Effects and Defects in Solids. 177 (5–6): 486–512. Bibcode:2022REDS..177..486V. doi:10.1080/10420150.2022.2048657.
Fukuda, Hiroshi (February 23, 2019). "Localized and cascading secondary electron generation as causes of stochastic defects in extreme ultraviolet projection lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 18 (1): 013503. Bibcode:2019JMM&M..18a3503F. doi:10.1117/1.JMM.18.1.013503.
Lee, Inhwan; Franke, Joern-Holger; Philipsen, Vicky; Ronse, Kurt; De Gendt, Stefan; Hendrickx, Eric (2023). "Hyper-NA EUV lithography: An imaging perspective". In Lio, Anna; Burkhardt, Martin (eds.). Optical and EUV Nanolithography XXXVI. Vol. 12494. p. 7. Bibcode:2023SPIE12494E..05L. doi:10.1117/12.2659153. ISBN 978-1-5106-6095-3.
Mojarad, Nassir; Gobrecht, Jens; Ekinci, Yasin (18 March 2015). "Beyond EUV lithography: a comparative study of efficient photoresists' performance". Scientific Reports. 5 (1): 9235. Bibcode:2015NatSR...5.9235M. doi:10.1038/srep09235. PMC 4363827. PMID 25783209.

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Bosgra, Jeroen; Zoethout, Erwin; van der Eerden, Ad M. J.; Verhoeven, Jan; van de Kruijs, Robbert W. E.; Yakshin, Andrey E.; Bijkerk, Fred (2012). "Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors". Applied Optics. 51 (36): 8541–8548. Bibcode:2012ApOpt..51.8541B. doi:10.1364/AO.51.008541. PMID 23262592.
Yakshin, A. E.; Kozhevnikov, I. V.; Zoethout, E.; Louis, E.; Bijkerk, F. (2010). "[PDF] Properties of broadband depth-graded multilayer mirrors for EUV optical systems. | Semantic Scholar". Optics Express. 18 (7): 6957–71. doi:10.1364/OE.18.006957. PMID 20389715. S2CID 16163302.
Zhang, Zinan; Li, Sikun; Wang, Xiangzhao; Cheng, Wei; Qi, Yuejing (2021). "Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm". Optics Express. 29 (4): 5448–5465. Bibcode:2021OExpr..29.5448Z. doi:10.1364/OE.418242. PMID 33726081. S2CID 232263498.
Huang, Y. H.; Lin, C. J.; King, Y. C. (2023). "A study of hydrogen plasma-induced charging effect in EUV lithography systems". Discover Nano. 18 (1): 22. Bibcode:2023NRL....18...22H. doi:10.1186/s11671-023-03799-4. PMC 9950305. PMID 36823307.
Mojarad, Nassir; Gobrecht, Jens; Ekinci, Yasin (18 March 2015). "Beyond EUV lithography: a comparative study of efficient photoresists' performance". Scientific Reports. 5 (1): 9235. Bibcode:2015NatSR...5.9235M. doi:10.1038/srep09235. PMC 4363827. PMID 25783209.

ncbi.nlm.nih.gov

Huang, Y. H.; Lin, C. J.; King, Y. C. (2023). "A study of hydrogen plasma-induced charging effect in EUV lithography systems". Discover Nano. 18 (1): 22. Bibcode:2023NRL....18...22H. doi:10.1186/s11671-023-03799-4. PMC 9950305. PMID 36823307.
Mojarad, Nassir; Gobrecht, Jens; Ekinci, Yasin (18 March 2015). "Beyond EUV lithography: a comparative study of efficient photoresists' performance". Scientific Reports. 5 (1): 9235. Bibcode:2015NatSR...5.9235M. doi:10.1038/srep09235. PMC 4363827. PMID 25783209.

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