Planar process (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Planar process" in English language version.

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4books.google.com

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1computerhistory.org

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books.google.com

Moskowitz, Sanford L. (2016). Advanced Materials Innovation: Managing Global Technology in the 21st century. John Wiley & Sons. p. 168. ISBN 978-0-470-50892-3.
Christophe Lécuyer; David C. Brook; Jay Last (2010). Makers of the Microchip: A Documentary History of Fairchild Semiconductor. MIT Press. pp. 62–63. ISBN 978-0-262-01424-3.
Claeys, Cor L. (2003). ULSI Process Integration III: Proceedings of the International Symposium. The Electrochemical Society. pp. 27–30. ISBN 978-1-56677-376-8.
Bassett, Ross Knox (2007). To the Digital Age: Research Labs, Start-up Companies, and the Rise of MOS Technology. Johns Hopkins University Press. p. 46. ISBN 9780801886393.

computerhistory.org

"1959: Practical Monolithic Integrated Circuit Concept Patented". Computer History Museum. Retrieved 13 August 2019.

doi.org

Butterfield, Andrew J.; Szymanski, John, eds. (2018). A Dictionary of Electronics and Electrical Engineering. Vol. 1. Oxford University Press. doi:10.1093/acref/9780198725725.001.0001. ISBN 978-0-19-872572-5.
Huff, Howard; Riordan, Michael (2007-09-01). "Frosch and Derick: Fifty Years Later (Foreword)". The Electrochemical Society Interface. 16 (3): 29. doi:10.1149/2.F02073IF. ISSN 1064-8208.
Frosch, C. J.; Derick, L (1957). "Surface Protection and Selective Masking during Diffusion in Silicon". Journal of the Electrochemical Society. 104 (9): 547. doi:10.1149/1.2428650.

espacenet.com

worldwide.espacenet.com

US 3025589 Hoerni, J. A.: "Method of Manufacturing Semiconductor Devices” filed May 1, 1959
US 3064167 Hoerni, J. A.: "Semiconductor device" filed May 15, 1960

iop.org

iopscience.iop.org

Huff, Howard; Riordan, Michael (2007-09-01). "Frosch and Derick: Fifty Years Later (Foreword)". The Electrochemical Society Interface. 16 (3): 29. doi:10.1149/2.F02073IF. ISSN 1064-8208.
Frosch, C. J.; Derick, L (1957). "Surface Protection and Selective Masking during Diffusion in Silicon". Journal of the Electrochemical Society. 104 (9): 547. doi:10.1149/1.2428650.

nasa.gov

hq.nasa.gov

"Integrated circuits". NASA. Retrieved 13 August 2019.

nist.gov

Shannon Hill. "UV Lithography: Taking Extreme Measures". National Institute of Standards and Technology (NIST).

oxfordreference.com

Butterfield, Andrew J.; Szymanski, John, eds. (2018). A Dictionary of Electronics and Electrical Engineering. Vol. 1. Oxford University Press. doi:10.1093/acref/9780198725725.001.0001. ISBN 978-0-19-872572-5.

patents.google.com

US2802760A, Lincoln, Derick & Frosch, Carl J., "Oxidation of semiconductive surfaces for controlled diffusion", issued 1957-08-13

worldcat.org

search.worldcat.org

Huff, Howard; Riordan, Michael (2007-09-01). "Frosch and Derick: Fifty Years Later (Foreword)". The Electrochemical Society Interface. 16 (3): 29. doi:10.1149/2.F02073IF. ISSN 1064-8208.