Trifluoruro de cloro (Spanish Wikipedia)

Analysis of information sources in references of the Wikipedia article "Trifluoruro de cloro" in Spanish language version.

refsWebsite

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5web.archive.org

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archive.org

Clark, John D. (1972). Ignition! An Informal History of Liquid Rocket Propellants. Rutgers University Press. pp. 214. ISBN 0-8135-0725-1.

astronautix.com

ClF3/Hydrazine Archivado el 2 de febrero de 2007 en Wayback Machine. at the Encyclopedia Astronautica.

doi.org

dx.doi.org

Hitoshi Habuka, Takahiro Sukenobu, Hideyuki Koda, Takashi Takeuchi, and Masahiko Aihara (2004). «Silicon Etch Rate Using Chlorine Trifluoride». Journal of the Electrochemical Society 151 (11): G783-G787. doi:10.1149/1.1806391.
Otto Ruff, H. Krug (1930). «Über ein neues Chlorfluorid-CIF₃». Zeitschrift für anorganische und allgemeine Chemie 190 (1): 270-276. doi:10.1002/zaac.19301900127.

nap.edu

books.nap.edu

Board on Environmental Studies and Toxicology, (BEST) (2006). Acute Exposure Guideline Levels for Selected Airborne Chemicals: Volume 5 (citation at the National Academies Press). Washington D.C.: National Academies Press. p. 40. ISBN 0-309-10358-4.

nist.gov

webbook.nist.gov

Número CAS

semiconductor.net

«In Situ Cleaning of CVD Chambers». Semiconductor International. 6 de enero de 1999. (enlace roto disponible en Internet Archive; véase el historial, la primera versión y la última).

web.archive.org

United States Patent 5849092 "Process for chlorine trifluoride chamber cleaning"
United States Patent 6034016 "Method for regenerating halogenated Lewis acid catalysts"
Air Products https://web.archive.org/web/20060318221608/http://www.airproducts.com/nr/rdonlyres/8479ed55-2170-4651-a3d4-223b2957a9f3/0/safetygram39.pdf
ClF3/Hydrazine Archivado el 2 de febrero de 2007 en Wayback Machine. at the Encyclopedia Astronautica.
«In Situ Cleaning of CVD Chambers». Semiconductor International. 6 de enero de 1999. (enlace roto disponible en Internet Archive; véase el historial, la primera versión y la última).