六氟化钨 (Chinese Wikipedia)
Analysis of information sources in references of the Wikipedia article "六氟化钨" in Chinese language version.
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books.google.com
- Roucan, J.-P.; Noël-Dutriaux, M.-C. Proprietes Physiques des Composes Mineraux. Ed. Techniques Ingénieur. : 138 [2021-12-15]. （原始内容存档于2022-01-04）.
- Lassner, E.; Schubert, W.-D. Tungsten - Properties, Chemistry, Technology of the Element, Alloys, and Chemical Compounds. Springer. 1999: 111, 168 [2021-12-15]. ISBN 0-306-45053-4. （原始内容存档于2022-01-04）.
doi.org
- Levy, J. The structures of fluorides XIII: The orthorhombic form of tungsten hexafluoride at 193 K by neutron diffraction. Journal of Solid State Chemistry. 1975, 15 (4): 360–365. doi:10.1016/0022-4596(75)90292-3.
- Cady, George H.; Hargreaves, George B. 306. Vapour pressures of some fluorides and oxyfluorides of molybdenum, tungsten, rhenium, and osmium. Journal of the Chemical Society (Resumed) (Royal Society of Chemistry (RSC)). 1961: 1568. ISSN 0368-1769. doi:10.1039/jr9610001568.
- Priest, H. F.; Swinehert, C. F. Anhydrous Metal Fluorides. Audrieth, L. F. (编). Inorganic Syntheses 3. Wiley-Interscience. 1950: 171–183. ISBN 978-0-470-13162-6. doi:10.1002/9780470132340.ch47.
- Kirss, R. U.; Meda, L. Chemical vapor deposition of tungsten oxide (PDF). Applied Organometallic Chemistry. 1998, 12 (3): 155–160 [2021-12-16]. doi:10.1002/(SICI)1099-0739(199803)12:3<155::AID-AOC688>3.0.CO;2-Z. hdl:2027.42/38321
. （原始内容 (PDF)存档于2021-08-28）.
espacenet.com
worldwide.espacenet.com
- US patent 6544889,「Method for tungsten chemical vapor deposition on a semiconductor substrate」,发行于2003-04-08
handle.net
hdl.handle.net
- Kirss, R. U.; Meda, L. Chemical vapor deposition of tungsten oxide (PDF). Applied Organometallic Chemistry. 1998, 12 (3): 155–160 [2021-12-16]. doi:10.1002/(SICI)1099-0739(199803)12:3<155::AID-AOC688>3.0.CO;2-Z. hdl:2027.42/38321 . （原始内容 (PDF)存档于2021-08-28）.
timedomaincvd.com
- Tungsten and Tungsten Silicide Chemical Vapor Deposition. CVD Fundamentals. TimeDomain CVD. [2021-12-15]. （原始内容存档于2009-09-14）.
umich.edu
deepblue.lib.umich.edu
- Kirss, R. U.; Meda, L. Chemical vapor deposition of tungsten oxide (PDF). Applied Organometallic Chemistry. 1998, 12 (3): 155–160 [2021-12-16]. doi:10.1002/(SICI)1099-0739(199803)12:3<155::AID-AOC688>3.0.CO;2-Z. hdl:2027.42/38321 . （原始内容 (PDF)存档于2021-08-28）.
vngas.com
- Tungsten Hexafluoride MSDS (PDF).[永久失效連結]
web.archive.org
- Roucan, J.-P.; Noël-Dutriaux, M.-C. Proprietes Physiques des Composes Mineraux. Ed. Techniques Ingénieur. : 138 [2021-12-15]. （原始内容存档于2022-01-04）.
- Gas chart （页面存档备份，存于互联网档案馆） (dead link 3 September 2019)
- Lassner, E.; Schubert, W.-D. Tungsten - Properties, Chemistry, Technology of the Element, Alloys, and Chemical Compounds. Springer. 1999: 111, 168 [2021-12-15]. ISBN 0-306-45053-4. （原始内容存档于2022-01-04）.
- Tungsten and Tungsten Silicide Chemical Vapor Deposition. CVD Fundamentals. TimeDomain CVD. [2021-12-15]. （原始内容存档于2009-09-14）.
- 存档副本. [2021-12-15]. （原始内容存档于2021-12-15）.
- Kirss, R. U.; Meda, L. Chemical vapor deposition of tungsten oxide (PDF). Applied Organometallic Chemistry. 1998, 12 (3): 155–160 [2021-12-16]. doi:10.1002/(SICI)1099-0739(199803)12:3<155::AID-AOC688>3.0.CO;2-Z. hdl:2027.42/38321 . （原始内容 (PDF)存档于2021-08-28）.
- Tungsten hexafluoride MSDS (PDF). Linde Gas. （原始内容 (PDF)存档于2010-02-12）.
worldcat.org
- Cady, George H.; Hargreaves, George B. 306. Vapour pressures of some fluorides and oxyfluorides of molybdenum, tungsten, rhenium, and osmium. Journal of the Chemical Society (Resumed) (Royal Society of Chemistry (RSC)). 1961: 1568. ISSN 0368-1769. doi:10.1039/jr9610001568.