Integrated circuit (English Wikipedia)

Fuller, C. S.; Ditzenberger, J. A. (July 1953). "Diffusion of Lithium into Germanium and Silicon". Physical Review. 91 (1): 193. Bibcode:1953PhRv...91..193F. doi:10.1103/PhysRev.91.193.
Fuller, C. S.; Struthers, J. D.; Ditzenberger, J. A.; Wolfstirn, K. B. (15 March 1954). "Diffusivity and Solubility of Copper in Germanium". Physical Review. 93 (6): 1182–1189. Bibcode:1954PhRv...93.1182F. doi:10.1103/PhysRev.93.1182.
Fuller, C. S.; Ditzenberger, J. A. (May 1956). "Diffusion of Donor and Acceptor Elements in Silicon". Journal of Applied Physics. 27 (5): 544–553. Bibcode:1956JAP....27..544F. doi:10.1063/1.1722419.
Fuller, C.S.; Whelan, J.M. (August 1958). "Diffusion, solubility, and electrical behavior of copper in gallium arsenide". Journal of Physics and Chemistry of Solids. 6 (2–3): 173–177. Bibcode:1958JPCS....6..173F. doi:10.1016/0022-3697(58)90091-X.
Miller, R. C.; Savage, A. (December 1956). "Diffusion of Aluminum in Single Crystal Silicon". Journal of Applied Physics. 27 (12): 1430–1432. Bibcode:1956JAP....27.1430M. doi:10.1063/1.1722283.
Kuo, Yue (1 January 2013). "Thin Film Transistor Technology—Past, Present, and Future" (PDF). The Electrochemical Society Interface. 22 (1): 55–61. Bibcode:2013ECSIn..22a..55K. doi:10.1149/2.F06131if.
Ligenza, J.R.; Spitzer, W.G. (July 1960). "The mechanisms for silicon oxidation in steam and oxygen". Journal of Physics and Chemistry of Solids. 14: 131–136. Bibcode:1960JPCS...14..131L. doi:10.1016/0022-3697(60)90219-5.
Hittinger, William C. (1973). "Metal–Oxide–Semiconductor Technology". Scientific American. 229 (2): 48–59. Bibcode:1973SciAm.229b..48H. doi:10.1038/scientificamerican0873-48. JSTOR 24923169.
Graham, Anthony H. D.; Robbins, Jon; Bowen, Chris R.; Taylor, John (2011). "Commercialisation of CMOS Integrated Circuit Technology in Multi-Electrode Arrays for Neuroscience and Cell-Based Biosensors". Sensors. 11 (5): 4943–4971. Bibcode:2011Senso..11.4943G. doi:10.3390/s110504943. PMC 3231360. PMID 22163884.
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Hittinger, William C. (1973). "Metal-Oxide-Semiconductor Technology". Scientific American. Vol. 229, no. 2. pp. 48–59. Bibcode:1973SciAm.229b..48H. doi:10.1038/scientificamerican0873-48. JSTOR 24923169.
Meindl, J.D. (November 1984). "Ultra-large scale integration". IEEE Transactions on Electron Devices. 31 (11): 1555–1561. Bibcode:1984ITED...31.1555M. doi:10.1109/T-ED.1984.21752.

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Horowitz, Paul; Hill, Winfield (1989). The Art of Electronics (2nd ed.). Cambridge University Press. p. 61. ISBN 978-0-521-37095-0. Integrated circuits, which have largely replaced circuits constructed from discrete transistors, are themselves merely arrays of transistors and other components built from a single chip of semiconductor material.
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Fuller, C. S.; Ditzenberger, J. A. (July 1953). "Diffusion of Lithium into Germanium and Silicon". Physical Review. 91 (1): 193. Bibcode:1953PhRv...91..193F. doi:10.1103/PhysRev.91.193.
Fuller, C. S.; Struthers, J. D.; Ditzenberger, J. A.; Wolfstirn, K. B. (15 March 1954). "Diffusivity and Solubility of Copper in Germanium". Physical Review. 93 (6): 1182–1189. Bibcode:1954PhRv...93.1182F. doi:10.1103/PhysRev.93.1182.
Fuller, C. S.; Ditzenberger, J. A. (May 1956). "Diffusion of Donor and Acceptor Elements in Silicon". Journal of Applied Physics. 27 (5): 544–553. Bibcode:1956JAP....27..544F. doi:10.1063/1.1722419.
Fuller, C.S.; Whelan, J.M. (August 1958). "Diffusion, solubility, and electrical behavior of copper in gallium arsenide". Journal of Physics and Chemistry of Solids. 6 (2–3): 173–177. Bibcode:1958JPCS....6..173F. doi:10.1016/0022-3697(58)90091-X.
Miller, R. C.; Savage, A. (December 1956). "Diffusion of Aluminum in Single Crystal Silicon". Journal of Applied Physics. 27 (12): 1430–1432. Bibcode:1956JAP....27.1430M. doi:10.1063/1.1722283.
Kuo, Yue (1 January 2013). "Thin Film Transistor Technology—Past, Present, and Future" (PDF). The Electrochemical Society Interface. 22 (1): 55–61. Bibcode:2013ECSIn..22a..55K. doi:10.1149/2.F06131if.
Huff, Howard; Riordan, Michael (September 2007). "Frosch and Derick: Fifty Years Later (Foreword)". The Electrochemical Society Interface. 16 (3): 29. doi:10.1149/2.F02073IF.
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Ligenza, J.R.; Spitzer, W.G. (July 1960). "The mechanisms for silicon oxidation in steam and oxygen". Journal of Physics and Chemistry of Solids. 14: 131–136. Bibcode:1960JPCS...14..131L. doi:10.1016/0022-3697(60)90219-5.
Shirriff, Ken (September 2016). "The surprising story of the first microprocessors". IEEE Spectrum. 53 (9): 48–54. doi:10.1109/MSPEC.2016.7551353.
Hittinger, William C. (1973). "Metal–Oxide–Semiconductor Technology". Scientific American. 229 (2): 48–59. Bibcode:1973SciAm.229b..48H. doi:10.1038/scientificamerican0873-48. JSTOR 24923169.
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Birkholz, M.; Mai, A.; Wenger, C.; Meliani, C.; Scholz, R. (2016). "Technology modules from micro- and nano-electronics for the life sciences". WIREs Nanomedicine and Nanobiotechnology. 8 (3): 355–377. doi:10.1002/wnan.1367. PMID 26391194.
Graham, Anthony H. D.; Robbins, Jon; Bowen, Chris R.; Taylor, John (2011). "Commercialisation of CMOS Integrated Circuit Technology in Multi-Electrode Arrays for Neuroscience and Cell-Based Biosensors". Sensors. 11 (5): 4943–4971. Bibcode:2011Senso..11.4943G. doi:10.3390/s110504943. PMC 3231360. PMID 22163884.
Basu, Joydeep (9 October 2019). "From Design to Tape-out in SCL 180 nm CMOS Integrated Circuit Fabrication Technology". IETE Journal of Education. 60 (2): 51–64. arXiv:1908.10674. doi:10.1080/09747338.2019.1657787.
Stern, Richard (1985). "MicroLaw". IEEE Micro. 5 (4): 90–92. Bibcode:1985IMicr...5d..90S. doi:10.1109/MM.1985.304489.
Kilby, J. S. (2007). "Miniaturized electronic circuits [US Patent No. 3,138, 743]". IEEE Solid-State Circuits Society Newsletter. 12 (2): 44–54. doi:10.1109/N-SSC.2007.4785580.
Hittinger, William C. (1973). "Metal-Oxide-Semiconductor Technology". Scientific American. Vol. 229, no. 2. pp. 48–59. Bibcode:1973SciAm.229b..48H. doi:10.1038/scientificamerican0873-48. JSTOR 24923169.
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Topol, A. W.; Tulipe, D. C. La; Shi, L.; Frank, D. J.; Bernstein, K.; Steen, S. E.; Kumar, A.; Singco, G. U.; Young, A. M.; Guarini, K. W.; Ieong, M. (July 2006). "Three-dimensional integrated circuits". IBM Journal of Research and Development. 50 (4.5): 491–506. doi:10.1147/rd.504.0491.

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Graham, Anthony H. D.; Robbins, Jon; Bowen, Chris R.; Taylor, John (2011). "Commercialisation of CMOS Integrated Circuit Technology in Multi-Electrode Arrays for Neuroscience and Cell-Based Biosensors". Sensors. 11 (5): 4943–4971. Bibcode:2011Senso..11.4943G. doi:10.3390/s110504943. PMC 3231360. PMID 22163884.

ncbi.nlm.nih.gov

Graham, Anthony H. D.; Robbins, Jon; Bowen, Chris R.; Taylor, John (2011). "Commercialisation of CMOS Integrated Circuit Technology in Multi-Electrode Arrays for Neuroscience and Cell-Based Biosensors". Sensors. 11 (5): 4943–4971. Bibcode:2011Senso..11.4943G. doi:10.3390/s110504943. PMC 3231360. PMID 22163884.

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Mead, Carver; Conway, Lynn (1991). Introduction to VLSI systems. Addison Wesley. ISBN 978-0-201-04358-7. OCLC 634332043.

Integrated circuit (English Wikipedia)

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copyright.gov (Global: 7,157th place; English: 4,246th place)

doi.org (Global: 2nd place; English: 2nd place)

edac.org (Global: low place; English: low place)

eetimes.com (Global: 4,224th place; English: 2,761st place)

electrochem.org (Global: low place; English: low place)

electronicdesign.com (Global: low place; English: low place)

engadget.com (Global: 613th place; English: 442nd place)

espacenet.com (Global: 950th place; English: 813th place)

worldwide.espacenet.com

ethw.org (Global: 9,545th place; English: 7,181st place)

heinonline.org (Global: 3,098th place; English: 1,655th place)

ieee.org (Global: 912th place; English: 722nd place)

spectrum.ieee.org

rebootingcomputing.ieee.org

ewh.ieee.org

ieeeghn.org (Global: low place; English: 9,546th place)

jedec.org (Global: low place; English: low place)

jstor.org (Global: 23rd place; English: 15th place)

nasa.gov (Global: 12th place; English: 73rd place)

hq.nasa.gov

natureinterface.com (Global: low place; English: low place)

nih.gov (Global: 5th place; English: 5th place)

pubmed.ncbi.nlm.nih.gov

ncbi.nlm.nih.gov

nildram.co.uk (Global: low place; English: low place)

homepages.nildram.co.uk

nobelprize.org (Global: 265th place; English: 450th place)

nvidia.com (Global: 2,958th place; English: 2,263rd place)

devblogs.nvidia.com

opticsinfobase.org (Global: low place; English: low place)

patents.google.com (Global: 1,154th place; English: 606th place)

pcworld.com (Global: 1,889th place; English: 1,323rd place)

phys.org (Global: 1,595th place; English: 1,363rd place)

physicsworld.com (Global: 6,771st place; English: 5,238th place)

researchgate.net (Global: 96th place; English: 89th place)

righto.com (Global: low place; English: low place)

samsung.com (Global: 2,692nd place; English: 2,465th place)

news.samsung.com

semiconductor-digest.com (Global: low place; English: low place)

sst.semiconductor-digest.com

semiengineering.com (Global: low place; English: low place)

stanford.edu (Global: 194th place; English: 182nd place)

asia.stanford.edu

ti.com (Global: 6,779th place; English: 4,625th place)

umich.edu (Global: 429th place; English: 307th place)

eecs.umich.edu

univ-pau.fr (Global: low place; English: low place)

iutbayonne.univ-pau.fr

wccftech.com (Global: 6,369th place; English: 4,426th place)

web.archive.org (Global: 1st place; English: 1st place)

wikichip.org (Global: low place; English: low place)

en.wikichip.org

wipo.int (Global: 1,556th place; English: 1,531st place)

wired.com (Global: 254th place; English: 178th place)

worldcat.org (Global: 4th place; English: 4th place)

search.worldcat.org

adsabs.harvard.edu (Global: 14^th place; English: 9^th place)

anandtech.com (Global: 1,850^th place; English: 1,272^nd place)

archive.org (Global: 6^th place; English: 6^th place)

arstechnica.com (Global: 473^rd place; English: 338^th place)

arxiv.org (Global: 49^th place; English: 31^st place)

books.google.com (Global: 3^rd place; English: 3^rd place)

cnet.com (Global: 447^th place; English: 345^th place)

columbia.edu (Global: 554^th place; English: 368^th place)

computer.org (Global: 6,549^th place; English: 4,616^th place)

computerhistory.org (Global: 2,702^nd place; English: 1,789^th place)

copyright.gov (Global: 7,157^th place; English: 4,246^th place)

doi.org (Global: 2^nd place; English: 2^nd place)

eetimes.com (Global: 4,224^th place; English: 2,761^st place)

engadget.com (Global: 613^th place; English: 442^nd place)

espacenet.com (Global: 950^th place; English: 813^th place)

ethw.org (Global: 9,545^th place; English: 7,181^st place)

heinonline.org (Global: 3,098^th place; English: 1,655^th place)

ieee.org (Global: 912^th place; English: 722^nd place)

ieeeghn.org (Global: low place; English: 9,546^th place)

jstor.org (Global: 23^rd place; English: 15^th place)

nasa.gov (Global: 12^th place; English: 73^rd place)

nih.gov (Global: 5^th place; English: 5^th place)

nobelprize.org (Global: 265^th place; English: 450^th place)

nvidia.com (Global: 2,958^th place; English: 2,263^rd place)

patents.google.com (Global: 1,154^th place; English: 606^th place)

pcworld.com (Global: 1,889^th place; English: 1,323^rd place)

phys.org (Global: 1,595^th place; English: 1,363^rd place)

physicsworld.com (Global: 6,771^st place; English: 5,238^th place)

researchgate.net (Global: 96^th place; English: 89^th place)

samsung.com (Global: 2,692^nd place; English: 2,465^th place)

stanford.edu (Global: 194^th place; English: 182^nd place)

ti.com (Global: 6,779^th place; English: 4,625^th place)

umich.edu (Global: 429^th place; English: 307^th place)

wccftech.com (Global: 6,369^th place; English: 4,426^th place)

web.archive.org (Global: 1^st place; English: 1^st place)

wipo.int (Global: 1,556^th place; English: 1,531^st place)

wired.com (Global: 254^th place; English: 178^th place)

worldcat.org (Global: 4^th place; English: 4^th place)